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Department of Materials Science and Engineering
2005 Fall Seminar Series
September 23

Kevin S. Jones
Professor & Chair
Department of Materials Science & Engineering
University of Florida
Gainesville, Florida

Exploring Ultra-shallow doping Techniques for
Advanced Microelectronic Device Fabrication

Abstract

Several new technologies for the formation of ultrashallow junctions in Si based microelectronic devices are presently being explored. These include the use sub keV ion implantation followed by high temperature flash annealing for 1.3 ms or non-melt laser annealing for times between 0.2 and 1.8ms at varying temperatures up to the melting point. The goal is to activate the dopants and evolve the implant damage to a stable state. Preamorphization has been incorporated in an effort to maximize the dopant activation during these ultra short time anneals. This talk will review work on the origins of dopant motion during these advanced anneals and the role solid phase regrowth plays on the final junction properties. The Flash studies will focus on issues of preamorphzation species and co-implants including fluorine effects as well as effects such as ramp rate. The non-melt laser results will focus on issues specific to this technology including estimating the temperature from the power, stitching effects and the role of multiple anneals on the activation, diffusion and defect evolution. Boxer Cross measurements of the microstructural evolution has proved useful in understanding stitching effects and when solid phase regrowth is complete. SIMS, Hall and TEM measurements indicate there is a time frame <= 200µsec) that is too short to achieve good junction formation at any temperature below melting. In addition the results indicate that regrowing the amorphous layer at higher temperatures increases the boron solubility during solid phase regrowth. These new annealing technologies show great promise for producing ultra-shallow junctions.

Biographical Information

Professor Holloway received his Ph.D. from Stanford University in Mechanical Engineering with a minor in Materials Science and Engineering.   His Ph.D. thesis work explored the relationship between the mechanical properties and chemical bonding in amorphous carbon nitride thin films using X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure (NEXAFS, aka XANES), Fourier transform infrared spectroscopy (FTIR), and nanoindention.   He also received his Masters from Stanford and graduated from the University of Florida with a B.S., both in Mechanical Engineering.  

After graduate school he was awarded an American Association for the Advancement of Science fellowship to serve as a staff resource to a member of Congress (Sen. John D. Rockefeller).   At the completion of his year as a AAAS Fellow, Dr. Holloway continued as a Legislative Assistant.   While serving in Sen. Rockefeller's office, Dr. Holloway dealt with technology transfer, agricultural, environmental, economic development, and science policy and appropriations policy and legislation issues.  

Dr. Holloway accepted a tenure-track faculty appointment in the newly formed Applied Science Department at the College of William & Mary in 1998 where he was granted tenure and promoted to Associate Professor in 2003.   His research has focused on nanostructure and thin film synthesis and application, with a special emphasis on carbon-based structures.   Current active research areas include high brightness field emission sources using carbon nanostructures, commercial-scale production of carbon nanotubes using laser ablation, and carbon thin film deposition for microelectronic applications.   He has over 20 publications and 30 invited presentations in the field as well as three patent disclosures.  

Professor Holloway has been involved in a number of professional committees and projects.   He is currently the immediate past Program Chair and current General Chair of the International Conference on Metallurgical Coatings and Thin Films, an AVS meeting sponsored by the ASED Division, is a member of the Executive Committee of the Thin Film Division of the AVS, serves on the Materials Research Society Public Policy Committee, and served as the MRS representative to the Alliance for Science and Technology Research in America (ASTRA) Board of Directors.   He has also served on the advisory board for three international workshops, been a session chair, symposium chair, and workshop moderator for AVS and MRS, and has been involved in several state-wide initiatives and workshops.  

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